Plasma enhanced rotational PECVD system,
BTF-1200C-R-PECVD
Product description：
The whole experimental cavity is in the glow generation region, uniform equivalent glow, this technology is a good solution to the traditional plasma work instability, In this way, the range and intensity of ionization is 100 times of that of the traditional PECVD, to the uneven accumulation of materials .
Use a quartz tube of a special shape (thin middle between two ends) as a reaction chamber for chemical vapor deposition.The furnace tube can rotate 360 degrees, Quartz stopper on the inner wall of the tube can help stir-fry the powder material and sintered more evenly, and the furnace body can be tilted to the left and right at a large angle, which is convenient to feed in and out, and the inclined angle is adjustable from 0 to 35 degree.
Widely used in the preparation of graphene at low temperature and the carbon coating experiment of powder material.
Main parameter：
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Furnace
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Max. Tem
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1200°C
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Heating zone length
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440mm
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Constant zone length
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200mm
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Tem. control
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PID automatic control with 30 steps programmable，Operation interface is 7 "industrial control computer
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Tube Size
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Φ60*420+Φ100*360+Φ60*420mm
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Furnace body inclination angle
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0~35°（adjustable）
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Furnace tube rotation rate
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3~13r/min
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PE source
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Signal frequency
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13.56 MHz±0.005%
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Power output range
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0-500W
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Max. reflection power
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100W
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RF output interface
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50 Ω, N-type, female
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Power stability
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≤5W
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Gas supply system
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High precision mass Flowmeter（Range optional）
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Accuracy
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±1.5%
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Response accuracy
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±0.2%
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Response time
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Gas characteristics：1～4sec
Electrical characteristics ：10sec
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Working pressure difference range
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0.1～0.5MPa
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Max. pressure
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3MPa
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Connection
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Φ6mmDouble clasp stainless steel joint
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Vacuum unit
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KF25 series bellows and manual stopper valves
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Vacuum degree
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10-1 pa
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The value can be displayed intuitively by the digital display vacuum tester
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